Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
2019年7月11日—Unlikeconventionallithographytechnologythatuseslighttoexposecircuitpatterns,nanoimprintlithographyfabricatesnanometer-scale ...
Contributing to Improved NIL-Equipment PerformanceUnlike conventional projection-type lithography equipment, NIL mask directly contacts with the resist, so the equipment and the resist interact. Therefore, the resist material is an extremely important factor that has a major effect on imprinting performance. Various types of performance are demanded of the resist material, including the filling speed for the concave patterns etched on the mask, the curing speed during UV light irradiation, the ability to retain shape against the release force that occurs when the mask is separated from the resist, and etching durability. As a result, developing this material takes an extremely long time. In general, when the composition of a material is changed to improve one aspect of performance, this affects a different aspect of performance as well. When it comes to compositional design, two approaches are possible: d...
Nanoimprint lithography | 台灣精品獎-歷屆得獎名單
Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
奈米壓印(Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
(PDF) Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
Chapter 2 Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
Nanoimprint Lithography | 台灣精品獎-歷屆得獎名單
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